Inside TSMC’s Phoenix, Arizona expansion struggles - Rest of World https://restofworld.org/2024/tsmc-arizona-expansion/
Missed deadlines and tension among Taiwanese and American coworkers are plaguing the chip giant’s Phoenix expansion.
#tsmc
Taiwan earthquakes and the semiconductor industry
So you have seen news about the recent earthquake. You also know Taiwan is producing around 90% of the world's leading edge semiconductors, and thus is bound to be affected by this in a special way.
Asianometry's Jon has this all detailed in this TSMC-focused video, which I recommend you watch.
In dieser Folge des #Piratencast sprechen @Zwecki / Flo :pd: :af:, @Manuel Wolf :pd: und @Anne Herpertz :af: :pd: über unsere #Demonstration gegen #Polizeigewalt, weitere Ankündigungen zu Demonstrationen und Events sowie über die Doppelsitzung des letzten #StaDDrat. Neben der diskriminierenden #Bezahlkarte für Geflüchtete geht es um #TSMC, den Verkehrsversuch am Blauen Wunder, um den Unsicheren Hafen sowie um weitere Punkte die im Stadtrat behandelt worden. Hört rein!
https://www.piraten-dresden.de/vom-stadtrat-der-tiere-zum-unmenschlichen-stadtrat/
"Teardown finds Huawei's 5nm notebook processor was made in Taiwan, not China."
"According to a teardown of Huawei's Qingyun L540 notebook by testers at TechInsights, the mysterious 5nm Kirin 9006C processor it contained was actually manufactured by Taiwan Semiconductor Manufacturing Co, not from a Middle Kingdom manufacturer."
"When the 14-inch ultralight first appeared in early December, the presence of a 5nm processor spurred furious speculation that China's domestic semiconductor manufacturing capability was far more advanced than previously thought."
Looks like the Chinese are not as advanced as I thought they might be.
Anyone here a Chinese chip expert, and want to explain the difference between Huawei's Kirin 9000S and 9006C?
Teardown finds Huawei's 5nm notebook processor was made in Taiwan, not China
Dresdner Werk von Chiphersteller TSMC ist auf dem Weg
Wirtschaft - Dresdner Werk von taiwanesischem Chiphersteller TSMC ist auf dem Weg
Der Chipkonzern TSMC aus Taiwan baut in Dresden eine Halbleiterfabrik mit 2000 Arbeitsplätzen. Die Fabrik soll weitere Hochtechnologie nach Sachsen holen.#Taiwan #Chipkonzern #TSMC #Dresden #Wirtschaft
Dresdner Werk von Chiphersteller TSMC ist auf dem Weg
#Piraten Stadtrat @mswdresden über das 50 Millionen Euro Geschenk an die Chipindustrie. Ein Kommentar:
Partages info-culturels du 28/01/2023
🛈📰🎹🎨📚 👨💻🌍🔗
En vrac : un rattrapage du plus significatif que j'ai déjà partagé récemment + divers autres liens susceptibles de vous intéresser mais n'incluant pas volontairement ce que vous avez déjà partagé ! Une #RevueDeWeb illustrée à l’aide de #MidJourney et #WordCloudLayout
Pourquoi l'économie mondiale repose entièrement sur Taïwan et TSMC | korii.
#économie #technologie #taïwan #semiconducteur #électronique #tsmc #industrie
A Hot New Weight Loss Drug Is Rapidly Aging Users' Faces
#médicament #santé #pertedepoids #vieillissement
Un chat meurt de la grippe aviaire dans les Deux-Sèvres : "Une première mondiale"
#grippeaviaire #h5n1 #chat #franchissementdelabarrièredespèces
Universal Digital Payments Network launched at Davos
#davos #foruméconomiquemondial #réseaudepaiementnumériqueuniversel #cryptomonnaie #monnaienumérique #banque #udpn
CLI tools you won't be able to live without 🔧 - DEV Community 👩💻
#outillage #lignedecommande #linux
Vitamin D Status in Hospitalized Patients with SARS-CoV-2 Infection | The Journal of Clinical Endocrinology & Metabolism | Oxford Academic
#covid19 #santé #vitamined #étude
Méditation de pleine conscience : des bénéfices en santé variés
#santé #santémentale #méditationdepleineconscience #stress
SFR fermera son réseau 2G en 2026, puis la 3G en 2028
#opérateursdetéléphonie #sfr #réseaumobile #2g #3g
Travailler moins permet d'obtenir une plus grande satisfaction dans la vie, tout comme gagner un revenu élevé, selon une nouvelle étude publiée dans la revue Health Economics
Surprise 🙄
#travail #bienêtre #qualitédevie #étude
Laurence Devillers sur Twitter : "Je suis impliquée dans la normalisation de l’IA au CEN CENELEC notamment sur les aspects de manipulation de masse ! Il est urgent de s’impliquer sur ces sujets et d’arrêter de dire que la régulation européenne est dépassée ! Elle n’est pas encore là messieurs les experts ! https://t.co/8Lsm1kKXPH" / Twitter
#laurencedevillers #intelligenceartificielle #unioneuropéenne #législation #tweet
La Russie affirme avoir intercepté des missiles de fabrication américaine au-dessus de son territoire
#conflitrussoukrainien #missile #étatsunis #ukraine #russie #guerre
Au Brésil, les forêts se portent mieux lorsque les autochtones ont des droits sur les terres
#environnement #écologie #forêt #brésil #autochtone #droitsurlaterre #droitfoncier #indigène #droitsdepropriétéfoncière #déforestation #étude
L’instabilité des revenus, une source de mal-être de plus en plus répandue
Surprise 🙄
#entreprise #entrepreneuriat #autoentrepreneuriat #économieàlatâche #gigeconomy #travailleurindépendant #revenu #économie #flexibilité #irrégularité #salaire #rémunération #instabilité #santé #stress #anxiété
Particules fines : le potentiel oxydant, indicateur de leur nocivité | IRD le Mag'
#environnement #pollution #particulesfines #potentieloxydant #oxydation #santé #santépublique #étude
Une nouvelle classe de peptides pour remplacer les produits chimiques en agriculture | INSB
#agriculture #peptide #écologie #expressiongénétique #résistance #étude #stressbiotique #stressabiotique
PiStorm32 lite – Accélérateur à base de Raspberry Pi pour Amiga 1200 – MicroMiga
😍😍😍
#amiga #retrogaming #raspberrypi
"Méga-bassines" : un militant écologiste découvre un traceur GPS de la police sous son véhicule
#police #militantisme #écologie #traçage #pistage #gps #mégabassine #julienleguet
[Café des Sciences] Jean-Baptiste Fressoz, De l’utopie atomique au déni climatique - YouTube
#conférence #conférencedébat #jeanbaptistefressoz #énergie #transitionénergétiqueetécologique #histoire #société #politique #écologie #gazàeffetdeserre #co2 #réchauffementclimatique #cafédessciences
This Physicist Says Electrons Spin in Quantum Physics After All. Here's Why : ScienceAlert
#physique #physiquequantique #physiquequantiquedeschamps #spin
Les mini-réacteurs nucléaires (SMR) sont-ils un mirage? | korii.
#nucléaire #réacteurnucléaire #centralenucléaire #miniréacteurnucléaire #énergie #énergienucléaire #smr #électricité
Un Toulousain a créé des data centers « de poche » pour particuliers, TPE et PME
J'ai l'impression qu'ils viennent de réinventer l'autohébergement / yunohost sur RasperryPi avec juste un peu de maintenance à distance plus mais un espace de stockage rikiki...
#ormeliawebindustrie #waouwbox #centrededonnées #stockageinformatique #cloud #autohébergement #tpe #pme #toulouse
Vaccin grippe et Covid-19 : les faire le même jour pourrait augmenter le risque d’AVC
#santé #vaccin #vaccination #covid19 #grippe #avc
Le chanvre, cette plante qui coche toute les cases de la transition écologique
#écologie #environnement #agriculture #chanvre #plante #france
Une enquête antitrust bientôt ouverte par la Commission européenne contre Microsoft Teams
#enquête #antitrust #unioneuropéenne #commissioneuropéenne #microsoft #microsoftteams #concurrencedéloyale #monopole #pratiqueanticoncurrentielle
Chip-Supermacht Taiwan | DW | 20.01.2023
Taiwan ist Weltführer bei Entwicklung und Produktion modernster Chips. Ein strategischer Trumpf gegenüber dem Festland, den der Inselstaat so schnell nicht verlieren wird, meinen Experten.#Taiwan #Chips #Halbleiter #TSMC #Globalisierung #China #USA #Computerchips
Chip-Supermacht Taiwan | DW | 20.01.2023
#Globalization is almost dead. Free #trade is almost dead.
source: https://nitter.pussthecat.org/kevinsxu/status/1602018649010630657
source: https://asia.nikkei.com/Business/Tech/Semiconductors/TSMC-founder-Morris-Chang-says-globalization-almost-dead
#TSMC #Taiwan #economy #world #politics #problem #future #humanity #news
Subventionspoker um Chips nimmt Fahrt auf | DW | 25.11.2022
Seit die USA mit gigantischen Förderprogrammen Hightech-Unternehmen in ihr Land locken, fordert Europas Chipbranche mehr Förderung aus Brüssel. Doch ist das überhaupt notwendig?#Halbleiter #Chips #EUChipsAct #TSMC #Taiwan #InflationReductionAct #PWC
Subventionspoker um Chips nimmt Fahrt auf | DW | 25.11.2022
তাইওয়ানের (আসল চীন) ওপর চীনের (কমিউনিস্ট চীন) তথাকথিত 'সামরিক মহড়া' কি ১৫ই আগস্ট পর্যন্ত এক্সটেন্ড করা হবে? কিন্তু কেন তাইওয়ান কেন এতটা ইম্পরট্যান্ট? কারণ বিশ্বের সিংহভাগ তোমার আমার মোবাইল, কম্পিউটারের ও ইলেকট্রনিক্সের প্রসেসর ও চিপের সেমিকন্ডাকটর তৈরী করে তাইওয়ান বা আসল চীন, স্পেসিফিক্যালি #tsmc 😁
Did communist PRC china extend their supposed "military drill" over ROC Taiwan to 15th august? 🤔
#ROC #PRC
How TSMC is making so much more money during the last decade. Notes from an investor call as reported on The Next Platform
Not every manufacturing node comes out perfectly and not every one comes out on time, but in the past decade and a half, Taiwan Semiconductor Manufacturing Co, [...] has done far better than any of its few remaining peers to push the chip manufacturing envelope while also maintaining consistent and profitable production of older nodes.
https://www.nextplatform.com/2022/01/14/the-money-printing-press-that-is-chip-maker-tsmc/
The youtube can haz astonishing recommendations. This is one of them re #semiconductors.
https://www.youtube.com/channel/UC1LpsuAUaKoMzzJSEt5WImw/community?lb=UgzOAcFrsYAxksI9mOp4AaABCQ
(via asianometry)
fascinating video(s)
thanks for making & sharing 🙂 will do the best to assemble an informative article 🙂
https://ytpak.net/watch?v=CkNn98WE5_k
https://ytpak.net/watch?v=oIiqVrKDtLc
market share of players
fascinating book
“If (when!) it works it’s going to be glorious, but that’s not to underestimate the challenges of getting there!”
Ångstrom Era
when semiconducters are smaller than 1nm (nanometer)
1 Å = 0.1 nanometre = 100 picometres
“Although deprecated by both the International Bureau of Weights and Measures (BIPM) and the US National Institute of Standards and Technology (NIST), the unit is still often used in the natural sciences and technology to express sizes of atoms, molecules, microscopic biological structures, and lengths of chemical bonds, arrangement of atoms in crystals, wavelengths of electromagnetic radiation, and dimensions of integrated circuit parts” (src: Wiki)
why did intel not go with picometers then? 🤔 (ANGST!)
“Cautions In Using High-NA EUV”
Frederick Chen (Advanced Memory Development at Winbond Electronics)
Published Sep 20, 2021
“High-NA EUV has received a lot of attention ever since Intel put the spotlight on its receiving the first 0.55 NA EUV tool from ASML [1], expected in 2025. EUV itself has numerous issues which have been enumerated by myself and others, most notoriously the stochastic defects issue. There are also a host of issues related to the propagation of the EUV light in 3D through the mask topology, with shadowing being the easiest description of the phenomenon [2]. It has already been disclosed by one EDA vendor, in fact, that EUV is being practiced with multipatterning [3], defeating the purpose for which it was originally intended. So, with the entry of high-NA EUV, the prospect of single patterning EUV makes it a very attractive option. What changes can we aspect with a high-NA EUV system compared to the current EUV system?”
“Improvements with High NA”
“The high NA increases the numerical aperture (NA) from the current value of 0.33 to 0.55. The first benefit is this decreases the minimum optical spot size to 60% of its current value. The nominal value is given by the Rayleigh criterion of 0.61*nominal wavelength(=13.5 nm)/NA, which is 25 nm for 0.33 NA and 15 nm for 0.55 NA. This, of course, helps gives a sharper aerial image, i.e., the classically projected image at the focused point in space. In reality, the image is noisier due to the limited number of photons and blurred by electrons and chemical species in the resist.
A second benefit from the high-NA system is the increased demagnification in the Y-direction (from 4X to 8X). This has the effect of reducing the spread of angles. Keeping the original 4X would have resulted in a prohibitive range of angles. This helps reduce the impact of the 3D propagation through the mask mentioned earlier. Furthermore, since the X-demagnification is the same, there is also a reduction in the range of azimuthal rotation of the plane of incidence through the slit. The illumination sine ratio (kx/4)/(ky/8) = 2 kx/ky on the mask is halved to kx/ky on the wafer, whereas for the current imaging systems the same ratio (kx/4)/(ky/4) on the mask is preserved as kx/ky on the wafer. Thus, this improves the illumination consistency through the slit.
Complications/Tradeoffs with High NA
There are three issues with the move to a higher NA. The first should be well-known to lithographers, since it is the reduced depth of focus [4]. While the 0.33 NA 13.5 nm wavelength gives a depth of focus of 120 nm, increasing the NA to 0.55 reduces the depth of focus to a third of that, 41 nm.
The second issue is a consequence of the 8x Y-demagnification. Since the EUV mask 104 mm x 132 mm field size is not changing, the scanned field on the wafer has to be halved (in Y) from 26 mm x 33 mm to 26 mm x 16.5 mm. If a chip pattern originally took up over half the 26 mm x 33 mm field (as usually the case, even as 3 x 3 dies, for example), it would be chopped midway, leading to the need to stitch the two parts together through the exposure of two masks. Hence, double exposure patterning may creep in, spoiling the single patterning scenario.
The third issue is definitely a gotcha, since it was supposed to have been avoided at all costs in previous lithography system designs. The use of larger mirrors in the high-NA EUV system has led to unavoidable obscuration, where one mirror cannot avoiding blocking another. This has fundamental optical consequences, particularly reduction of modulation at lower spatial frequencies [5]. In some cases, the effects can be very drastic. In the example of a staggered 40 nm x 70 nm array below, one of the diffraction orders is obstructed by the central obscuration in the pupil of the 0.55 NA system.”
“In this example, it would lead to a doubling of the spatial frequency in the y-direction, which is a basic imaging error. The required modulation of the fundamental spatial frequency in the y-direction is eliminated when it should be kept for this pattern. Since much of the pupil is covered by forbidden illumination zones (shown in pink), this is difficult to integrate with other patterns which normally require more flexible illumination. For larger pitches of the same staggered array pattern, the zones would crowd closer together, allowing even less flexibility. This is something the high-NA EUV user has to be especially aware of.
No, stochastics will not go away
The use of higher NA reduces the spot size, and hence, the image pixel size is also effectively reduced. We also expect the resist blur to be reduced in order to take advantage of higher resolution. Hence, at the same dose and k1 (feature size normalized to wavelength/NA), the number of photons in the same number of edge pixels will continue to decrease. This means the stochastic issues of EUV imaging will persist at the feature edge.”
“References
[2] A. Erdmann et al., “3D mask effects in high NA EUV imaging,” Proc. SPIE 10957, 109570Z (2019).
[3] https://www.ednasia.com/multi-patterning-strategies-for-navigating-the-sub-5-nm-frontier-part-3/
[4] B. J. Lin, “The k3 coefficient in nonparaxial l/NA scaling equations for resolution, depth of focus, and immersion lithography” J. Micro/Nanolith. MEMS MOEMS 1(1) 7–12 (April 2002).
[5] S. T. Yang et al., “Effect of central obscuration on image formation in projection lithography,” Proc. SPIE 1264, 477 (1990).”
src: linkedin.com
Links:
https://www.imec-int.com/en/articles/high-na-euvl-next-major-step-lithography
#linux #gnu #gnulinux #opensource #administration #sysops #cpu #hardware #amd #intel #ai #superpower #china #taiwan #asml #tsmc #arm
Originally posted at: https://dwaves.de/2021/11/13/ai-superpowers-china-silicon-valley-and-the-new-world-order-kai-fu-lee-light-and-silicon-extreme-ultra-violet-cpu-production-asml-netherlands-tsmc-taiwan-amd-intel-usa-and-the-crazy-phys/
fascinating video(s)
thanks for making & sharing 🙂 will do the best to assemble an informative article 🙂
https://ytpak.net/watch?v=CkNn98WE5_k
https://ytpak.net/watch?v=oIiqVrKDtLc
market share of players
fascinating book
https://duckduckgo.com/?q=China+Silicon+Valley+And+The+New+World+&ia=web
“If (when!) it works it’s going to be glorious, but that’s not to underestimate the challenges of getting there!”
Ångstrom Era
when semiconducters are smaller than 1nm (nanometer)
1 Å = 0.1 nanometre = 100 picometres
“Although deprecated by both the International Bureau of Weights and Measures (BIPM) and the US National Institute of Standards and Technology (NIST), the unit is still often used in the natural sciences and technology to express sizes of atoms, molecules, microscopic biological structures, and lengths of chemical bonds, arrangement of atoms in crystals, wavelengths of electromagnetic radiation, and dimensions of integrated circuit parts” (src: Wiki)
why did intel not go with picometers then? 🤔 (ANGST!)
“Cautions In Using High-NA EUV”
Frederick Chen (Advanced Memory Development at Winbond Electronics)Published Sep 20, 2021
“High-NA EUV has received a lot of attention ever since Intel put the spotlight on its receiving the first 0.55 NA EUV tool from ASML [1], expected in 2025. EUV itself has numerous issues which have been enumerated by myself and others, most notoriously the stochastic defects issue. There are also a host of issues related to the propagation of the EUV light in 3D through the mask topology, with shadowing being the easiest description of the phenomenon [2]. It has already been disclosed by one EDA vendor, in fact, that EUV is being practiced with multipatterning [3], defeating the purpose for which it was originally intended. So, with the entry of high-NA EUV, the prospect of single patterning EUV makes it a very attractive option. What changes can we aspect with a high-NA EUV system compared to the current EUV system?”
“Improvements with High NA”
“The high NA increases the numerical aperture (NA) from the current value of 0.33 to 0.55. The first benefit is this decreases the minimum optical spot size to 60% of its current value. The nominal value is given by the Rayleigh criterion of 0.61*nominal wavelength(=13.5 nm)/NA, which is 25 nm for 0.33 NA and 15 nm for 0.55 NA. This, of course, helps gives a sharper aerial image, i.e., the classically projected image at the focused point in space. In reality, the image is noisier due to the limited number of photons and blurred by electrons and chemical species in the resist.
A second benefit from the high-NA system is the increased demagnification in the Y-direction (from 4X to 8X). This has the effect of reducing the spread of angles. Keeping the original 4X would have resulted in a prohibitive range of angles. This helps reduce the impact of the 3D propagation through the mask mentioned earlier. Furthermore, since the X-demagnification is the same, there is also a reduction in the range of azimuthal rotation of the plane of incidence through the slit. The illumination sine ratio (kx/4)/(ky/8) = 2 kx/ky on the mask is halved to kx/ky on the wafer, whereas for the current imaging systems the same ratio (kx/4)/(ky/4) on the mask is preserved as kx/ky on the wafer. Thus, this improves the illumination consistency through the slit.
Complications/Tradeoffs with High NA
There are three issues with the move to a higher NA. The first should be well-known to lithographers, since it is the reduced depth of focus [4]. While the 0.33 NA 13.5 nm wavelength gives a depth of focus of 120 nm, increasing the NA to 0.55 reduces the depth of focus to a third of that, 41 nm.
The second issue is a consequence of the 8x Y-demagnification. Since the EUV mask 104 mm x 132 mm field size is not changing, the scanned field on the wafer has to be halved (in Y) from 26 mm x 33 mm to 26 mm x 16.5 mm. If a chip pattern originally took up over half the 26 mm x 33 mm field (as usually the case, even as 3 x 3 dies, for example), it would be chopped midway, leading to the need to stitch the two parts together through the exposure of two masks. Hence, double exposure patterning may creep in, spoiling the single patterning scenario.
The third issue is definitely a gotcha, since it was supposed to have been avoided at all costs in previous lithography system designs. The use of larger mirrors in the high-NA EUV system has led to unavoidable obscuration, where one mirror cannot avoiding blocking another. This has fundamental optical consequences, particularly reduction of modulation at lower spatial frequencies [5]. In some cases, the effects can be very drastic. In the example of a staggered 40 nm x 70 nm array below, one of the diffraction orders is obstructed by the central obscuration in the pupil of the 0.55 NA system.”
“In this example, it would lead to a doubling of the spatial frequency in the y-direction, which is a basic imaging error. The required modulation of the fundamental spatial frequency in the y-direction is eliminated when it should be kept for this pattern. Since much of the pupil is covered by forbidden illumination zones (shown in pink), this is difficult to integrate with other patterns which normally require more flexible illumination. For larger pitches of the same staggered array pattern, the zones would crowd closer together, allowing even less flexibility. This is something the high-NA EUV user has to be especially aware of.
No, stochastics will not go away
The use of higher NA reduces the spot size, and hence, the image pixel size is also effectively reduced. We also expect the resist blur to be reduced in order to take advantage of higher resolution. Hence, at the same dose and k1 (feature size normalized to wavelength/NA), the number of photons in the same number of edge pixels will continue to decrease. This means the stochastic issues of EUV imaging will persist at the feature edge.”
“References
[2] A. Erdmann et al., “3D mask effects in high NA EUV imaging,” Proc. SPIE 10957, 109570Z (2019).
[3] https://www.ednasia.com/multi-patterning-strategies-for-navigating-the-sub-5-nm-frontier-part-3/
[4] B. J. Lin, “The k3 coefficient in nonparaxial l/NA scaling equations for resolution, depth of focus, and immersion lithography” J. Micro/Nanolith. MEMS MOEMS 1(1) 7–12 (April 2002).
[5] S. T. Yang et al., “Effect of central obscuration on image formation in projection lithography,” Proc. SPIE 1264, 477 (1990).”
src: linkedin.com
Links:
https://www.imec-int.com/en/articles/high-na-euvl-next-major-step-lithography
#linux #gnu #gnulinux #opensource #administration #sysops #cpu #hardware #amd #intel #ai #superpower #china #taiwan #asml #tsmc #arm
Originally posted at: https://dwaves.de/2021/11/13/ai-superpowers-china-silicon-valley-and-the-new-world-order-kai-fu-lee-light-and-silicon-extreme-ultra-violet-cpu-production-asml-netherlands-tsmc-taiwan-amd-intel-usa-and-the-crazy-phys/
If you didn't know how (PR) China's economic miracle of today came about, look no further than Taiwan. Who is China's biggest employer? Foxconn from Taiwan, with a workforce of 15 million on the mainland. And there's more examples, in a decades long history of value chains and the 台商.
This Podcast episode from Supchina has it all, starting with Japanese colonial times, a Chinese Civil War and cross-strait economic ties.
Sinica Podcast: How Taiwan propelled China’s economic rise, with Shelley Rigger https://chrt.fm/track/47257E/pdcn.co/e/rss.art19.com/episodes/581087c2-5ab9-46c8-9b0c-23929f5b3999.mp3?rss_browser=BAhJIg9BbnRlbm5hUG9kBjoGRVQ%3D--bba5bdd77df5f5806138bf3e7d4615ea7f8e6a75
#semiconductor #prchina #taiwan #economics #politics #foxconn #tsmc #huawei
Next chapter..
“Taiwan is an austere rock in a typhoon-laden sea with 24 million people.”
https://mobile.twitter.com/heguisen/status/1450967872902074374